发明名称 |
Gate electrode of a semiconductor device and method of forming the same |
摘要 |
Disclosed are an electrode of a semiconductor device and a method of forming the same. A polysilicon layer is formed on a semiconductor substrate. An amorphous silicon capping layer is then formed on the polysilicon layer. A silicide layer is formed on the capping layer. The capping layer prevents chlorine ions from diffusing downward to the polysilicon layer. Accordingly, abnormal growth of the polysilicon layer can be prevented, thus improving the stability of the electrical characteristics of a semiconductor device electrode.
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申请公布号 |
US2004126949(A1) |
申请公布日期 |
2004.07.01 |
申请号 |
US20030626096 |
申请日期 |
2003.07.23 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE SEUNG-JAE;HONG JIN-GI |
分类号 |
H01L21/28;H01L29/423;(IPC1-7):H01L21/336 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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