发明名称 |
Method of fabricating optical waveguide devices with smooth and flat dielectric interfaces |
摘要 |
One or more embodiments of the instant invention may be briefly summarized as follows. A planarization and smoothing segment includes: (a) a reverse mask and etching method; a sacrificial layer and selective CMP followed by non selective CMP; or a sacrificial layer and selective etching followed by non-selective CMP. A buffer layer to protect wave guide segment includes: (a) waveguide formation followed by buffer layer deposition; or a buffer deposition over the waveguide layer followed by waveguide formation.
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申请公布号 |
US2004120677(A1) |
申请公布日期 |
2004.06.24 |
申请号 |
US20030727201 |
申请日期 |
2003.12.03 |
申请人 |
AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH |
发明人 |
MO KANG JOON;DOAN MY THE;LIM DESMOND R. |
分类号 |
G02B6/12;G02B6/132;G02B6/136;(IPC1-7):G02B6/10 |
主分类号 |
G02B6/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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