| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide inspecting method, device or the like for a mask by deciding the degree of adhesion of contamination to the stencil type mask. <P>SOLUTION: An inspection membrane 51, on which a multitude of rows of fine perforations 53 are arrayed, is formed on the mask 10 which becomes the object of inspection while a Faraday cup 55 for measuring the amount of current of electronic beams which have penetrated the fine perforations 53 of the membrane 51 is provided on a wafer stage 24. The amount of current of the electronic beams penetrated through the fine perforations 53 of the membrane 51 is measured by the Faraday cup 55 to decide the degree of adhesion of contamination to the mask 10, in accordance with the degree of deterioration of the amount of penetrating current. Upon alignment in the aligner, the mask (reticle) is inspected periodically to know the adhering condition of contamination to the mask, and when the amount of adhesion has exceeded an allowable range, the mask is washed or exchanged. <P>COPYRIGHT: (C)2004,JPO</p> |
