| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a base layer film material for a multilayer resist process which is excellent in durability against a photoresist developer solution, is removable by using a photoresist stripping liquid after used, and facilitates the rework of the substrate, and to provide a wiring formation method using the base layer film material. <P>SOLUTION: The base layer film material is prepared by incorporating as a resin component a resin having at least a substituent which leaves the end group to produce a sulfonic acid residue when specified energy is applied. As for the resin component, a compound having at least a repeating unit expressed by formula (1) is preferable. In formula (1), n represents an integer ≥1, X represents a 1-10C straight-chain or branched alkyl chain, an aromatic or alicyclic cyclic alkyl chain, or an alkyl ester chain, and Y represents a substituent which generates a sulfonic acid residue when specified energy is applied. <P>COPYRIGHT: (C)2004,JPO |
