Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system

摘要

A cleaning system (100) for removing contamination (105) from at least a part of a surface (104) of a component (101) in a lithographic projection apparatus (1), comprising: a cleaning particle provider for providing cleaning particles near said surface, which cleaning particle provider comprises an electric field generator (106,V) for generating an electric field (107). Furthermore, a method for removing contamination (105) from at least a part of a surface (104) of a component (101) of a lithographic projection apparatus (1). <??>The method comprises generating an electric field in at least a part of the lithographic projection apparatus; providing cleaning particles near the contamination by means of said electric field (107); and removing said contamination via interaction of said cleaning particles with said contamination. Thereby, contamination (105) is removed from the surface (104).