| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having high photosensitivity even in a specified wavelength region where an acid generating agent does not function, and in particular, suitable for exposure at 320 to 450 nm. <P>SOLUTION: In the photosensitive composition containing (A) a resin, (B) a photoacid generating agent and (C) a sensitizer, the sensitizer (C) is a compound expressed by general formula (1) which absorbs light at 320 to 450 nm. The photoacid generating agent (B) is a compound (B-1) which does not generate an acid by exposure at 405 nm wavelength. In formula, each of R<SB>1</SB>to R<SB>6</SB>, X, Y independently represents a hydrogen atom or an organic group, either X or Y represents at least an electron withdrawing group, and at least one in R<SB>1</SB>to R<SB>5</SB>represents an electron donating group, and adjacent two groups in R<SB>1</SB>to R<SB>5</SB>may be coupled to form a ring. <P>COPYRIGHT: (C)2004,JPO |
