发明名称 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURED BY THE SAME WHICH HAVE HIGHER THROUGH-PUT USING THE LITHOGRAPHIC PROJECTION APPARATUS
摘要 PURPOSE: Provided are a lithographic projection apparatus and a small device with dimension of micrometers or less such as "bio-chips" and having higher through-put using the lithographic projection apparatus. CONSTITUTION: The lithographic projection apparatus comprises a radiation system for introducing radiation projection beam; a patterning means for the projection beam depending on desired patterns; a mask table for fixing a substrate(W); a projection system for projecting the patterned beam on a targeting part of the substrate; and a fluid treatment cell mounted on the substrate and communicating surface thereof. The fluid treatment cell(FC) is for contacting the fluid and the targeting part to derive inter-reaction between them. The cell further includes a plurality of individual chambers mounted on the mask table and communicating respective areas of the substrate.
申请公布号 KR20040047713(A) 申请公布日期 2004.06.05
申请号 KR20030085371 申请日期 2003.11.28
申请人 ASML NETHERLANDS B.V. 发明人 SIMON KLAUS;LOF JOERI;MINNAERT ARTHUR WINFRIED EDUARDUS;SMEETS ERIK MARIE JOSE
分类号 B81C1/00;C40B60/14;G03F7/20;(IPC1-7):G03F7/20 主分类号 B81C1/00
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