发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURED BY THE SAME WHICH HAVE HIGHER THROUGH-PUT USING THE LITHOGRAPHIC PROJECTION APPARATUS |
摘要 |
PURPOSE: Provided are a lithographic projection apparatus and a small device with dimension of micrometers or less such as "bio-chips" and having higher through-put using the lithographic projection apparatus. CONSTITUTION: The lithographic projection apparatus comprises a radiation system for introducing radiation projection beam; a patterning means for the projection beam depending on desired patterns; a mask table for fixing a substrate(W); a projection system for projecting the patterned beam on a targeting part of the substrate; and a fluid treatment cell mounted on the substrate and communicating surface thereof. The fluid treatment cell(FC) is for contacting the fluid and the targeting part to derive inter-reaction between them. The cell further includes a plurality of individual chambers mounted on the mask table and communicating respective areas of the substrate.
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申请公布号 |
KR20040047713(A) |
申请公布日期 |
2004.06.05 |
申请号 |
KR20030085371 |
申请日期 |
2003.11.28 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
SIMON KLAUS;LOF JOERI;MINNAERT ARTHUR WINFRIED EDUARDUS;SMEETS ERIK MARIE JOSE |
分类号 |
B81C1/00;C40B60/14;G03F7/20;(IPC1-7):G03F7/20 |
主分类号 |
B81C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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