CONCENTRATION PROFILE CALIBRATION METHOD AND CONCENTRATION PROFILE ANALYSIS PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a sputter rate and a relative sensitivity coefficient that are used for the quantitative analysis of an element of a target test piece without measurement of sputter depth by using a level difference meter.

SOLUTION: In the case of element analysis of the target test piece, element analysis is conducted by using ion sputtering of a standard test piece (S1). On the data obtained by the analysis, the sputter rate SR and the relative sensitivity coefficient RSF(S3-S6) is obtained by fitting (S2) of a concentration profile (model function) decided beforehand. By using this sputter rate SR and relative sensitivity coefficient RSF, the concentration profile of the target test piece is obtained (S7).

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