发明名称 |
CHEMICAL DECONTAMINATION SYSTEM FOR DISSOLVING CHEMICALLY OXIDE LAYER FORMED ON SURFACE OF CONTAMINATED COMPONENT AND DECONTAMINATING METHOD THEREOF |
摘要 |
<p>PURPOSE: A chemical decontamination system for dissolving chemically an oxide layer formed on a surface of a contaminated component and a decontaminating method thereof are provided to enhance a dissolving rate and obtain decontamination performance equivalent to oxalic acid without performing a process or using a device for reducing trivalent iron ions into bivalent iron ions. CONSTITUTION: A decontaminating method includes a reducing and dissolving process and an oxidizing and dissolving process. The reducing and dissolving process is performed to bring a surface of a radioactive part into contact with reducing decontamination liquid including mono-carboxylic acid and di-carboxylic acid as dissolvent. The oxidizing and dissolving process is performed to bring the surface of the radioactive part into contact with oxidizing decontamination liquid including oxidizer.</p> |
申请公布号 |
KR20040045334(A) |
申请公布日期 |
2004.06.01 |
申请号 |
KR20030082748 |
申请日期 |
2003.11.20 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
ENDA MASAMI;YAITA YUMI;SATO MITSUYOSHI;SAKAI HITOSHI;KANASAKI TAKESHI;INAMI ICHIRO |
分类号 |
G21F9/28;G21F9/00;(IPC1-7):G21F9/28 |
主分类号 |
G21F9/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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