发明名称 CHEMICAL DECONTAMINATION SYSTEM FOR DISSOLVING CHEMICALLY OXIDE LAYER FORMED ON SURFACE OF CONTAMINATED COMPONENT AND DECONTAMINATING METHOD THEREOF
摘要 <p>PURPOSE: A chemical decontamination system for dissolving chemically an oxide layer formed on a surface of a contaminated component and a decontaminating method thereof are provided to enhance a dissolving rate and obtain decontamination performance equivalent to oxalic acid without performing a process or using a device for reducing trivalent iron ions into bivalent iron ions. CONSTITUTION: A decontaminating method includes a reducing and dissolving process and an oxidizing and dissolving process. The reducing and dissolving process is performed to bring a surface of a radioactive part into contact with reducing decontamination liquid including mono-carboxylic acid and di-carboxylic acid as dissolvent. The oxidizing and dissolving process is performed to bring the surface of the radioactive part into contact with oxidizing decontamination liquid including oxidizer.</p>
申请公布号 KR20040045334(A) 申请公布日期 2004.06.01
申请号 KR20030082748 申请日期 2003.11.20
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 ENDA MASAMI;YAITA YUMI;SATO MITSUYOSHI;SAKAI HITOSHI;KANASAKI TAKESHI;INAMI ICHIRO
分类号 G21F9/28;G21F9/00;(IPC1-7):G21F9/28 主分类号 G21F9/28
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