| 摘要 |
PROBLEM TO BE SOLVED: To provide an observation method of a semiconductor structure capable of observing a structure having large aspect ratio with higher freedom, and to provide an electronic microscope system. SOLUTION: An electronic microscope system comprises an electron microscope optical component 27 creating an image of secondary electron emitted from the semiconductor device 3 located in a visual field 37 of an object to be magnified, on a detection device 35 having a position detecting function; and an irradiation devices 55, 59 for emitting primary energy beams 51, 53, and the observation method of the semiconductor device includes a process of irradiating the primary energy beams 51, 53 at least against the object to be magnified in order to make the semiconductor device 3 emit secondary electron. The semiconductor device 3 has an upper surface with large aspect furnished by a first material 11, and a recess part having a bottom 17 furnished by a second material 13. COPYRIGHT: (C)2004,JPO
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