发明名称 |
Method for manufacturing surface acoustic wave apparatus |
摘要 |
A method for manufacturing a surface acoustic wave apparatus decreases a specific resistance of an electrode film by removing hydrogen occluded in the electrode film that is primarily composed of tantalum, so that the device properties are stabilized. An electrode film primarily composed of tantalum is formed on a piezoelectric substrate. Subsequently, this electrode film is heat-treated in a vacuum at a temperature of about 200° C. to about 700° C. for several hours. Thereafter, the electrode film is patterned so as to produce an interdigital electrode transducer.
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申请公布号 |
US6725513(B2) |
申请公布日期 |
2004.04.27 |
申请号 |
US20010875216 |
申请日期 |
2001.06.06 |
申请人 |
MURATA MANUFACTURING CO., LTD. |
发明人 |
NAKAGAWA MASATOSHI;TOSE MAKOTO;KOSHIDO YOSHIHIRO;FUJIMOTO KOJI;NAKAO TAKESHI |
分类号 |
H02N2/00;H03H3/08;H03H9/145;(IPC1-7):H04R17/00;H01L41/04;H05K3/02;H05K3/20 |
主分类号 |
H02N2/00 |
代理机构 |
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