发明名称 THIN FILM FORMING DEVICE AND THIN FILM FORMING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a thin film forming device and thin film forming method for forming a thin film such as an organic thin film in a desired shape and thickness on an object to be formed such as a substrate. SOLUTION: In the thin film forming device 1, a first shadow mask 6 is made close to or in contact with the substrate 2, and a second shadow mask 7 is arranged so as to maintain a certain distance from the first shadow mask 6. In forming the organic thin film, the first shadow mask 6 is fixed, and only the second shadow mask 7 with an opening part formed is moved so that deposition material reaches to a specific group of opening parts of the first shadow mask 6. A predetermined organic thin film is formed in a predetermined region on the substrate 2 by appropriately changing positional relation between the first and second shadow masks 6, 7. In the thin film forming device 1, entering of the deposition material after the first shadow mask 6 passes is suppressed, and damage and transfer of the formed organic thin film with movement of the second shadow mask 7 is prevented. Thereby, the organic thin film of a predetermined shape and thickness is formed in the predetermined region on the substrate 2. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004119064(A) 申请公布日期 2004.04.15
申请号 JP20020277816 申请日期 2002.09.24
申请人 FUJITSU LTD 发明人 IIJIMA MAKOTO;SATO YU
分类号 H05B33/10;C23C14/24;H01L51/50;H05B33/14;(IPC1-7):H05B33/10 主分类号 H05B33/10
代理机构 代理人
主权项
地址