发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device which improves the electric activation rate of impurities and uses an impurity-doped layer deterring impurities from being diffused. SOLUTION: First impurities 61 having covalent bond radii larger than the covalent bond radius of a semiconductor atom 51, and second impurities 62 having covalent bond radii smaller than the covalent bond radius of the semiconductor atom 51, are arranged in a semiconductor adjacent to each other. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004119513(A) 申请公布日期 2004.04.15
申请号 JP20020278088 申请日期 2002.09.24
申请人 TOSHIBA CORP 发明人 YAMAUCHI ATSUSHI;AOKI NOBUTOSHI
分类号 H01L21/24;H01L21/22;H01L21/265;H01L21/336;H01L21/425;H01L27/148;H01L29/12;H01L29/772;H01L29/78;(IPC1-7):H01L21/265 主分类号 H01L21/24
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