| 摘要 |
PROBLEM TO BE SOLVED: To provide a deposition system and deposition method capable of depositing films densified to a high degree. SOLUTION: An evaporation source 2 packed with a thin film forming material is disposed within a vacuum chamber 1 consisting of a conductive material and a cylindrical substrate holder 5 consisting of the conductive material is disposed therein. A disk-shaped substrate 7 is attached to a substrate holding section 5a of the substrate holder 5 and further, annular permanent magnets 8A and 8B aligned in the central axes to the substrate 7 are arranged on the surface of the substrate 7 on the side opposite to its deposition surface. The permanent magnets 8A and 8B are fixed by a magnet fixing plate 17 composed of a magnetic material. COPYRIGHT: (C)2004,JPO
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