| 发明名称 |
Fabrication of metallic microstructures via exposure of photosensitive composition |
| 摘要 |
A method of forming microstructures. An article including a metal atom precursor is disproportionally exposed to electromagnetic radiation in an amount and intensity sufficient to convert some of the precursor to elemental metal. Additional conductive material may then be deposited onto the elemental metal to produce a microstructure.
|
| 申请公布号 |
US6706165(B2) |
申请公布日期 |
2004.03.16 |
| 申请号 |
US20010755645 |
申请日期 |
2001.01.05 |
| 申请人 |
PRESIDENT AND FELLOWS OF HARVARD COLLEGE |
发明人 |
DENG TAO;ARIAS FRANCISCO;ISMAGILOV RUSTEM F.;KENIS PAUL J. A.;WHITESIDES GEORGE M. |
| 分类号 |
B81C1/00;C23C18/16;H05K3/10;H05K3/18;(IPC1-7):C25D5/00 |
主分类号 |
B81C1/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
