| 摘要 |
PROBLEM TO BE SOLVED: To provide a thin film forming system capable of supplying gaseous raw materials uniformly onto a substrate surface, thereby uniformizing the thickness of an organic thin film formed on the substrate surface. SOLUTION: The thin film forming system is provided with a vacuum chamber 11, a substrate holder 12 disposed within the vacuum chamber 11 and a gas supply end 22 for supplying the gas toward a substrate fitting surface 12a of the substrate holder 12. The gas supply end 22 is so formed that the gaseous raw materials are supplied in a longer form to the surface 12a. COPYRIGHT: (C)2004,JPO
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