Method for fabricating carbon nanotube device

摘要

A method for fabricating a carbon nanotube device, characterized in that selective chemical vapor-phase deposition is performed on the lateral sides of the portion where the carbon nanotube device is to be formed defined by using the density of catalyst grains as well as etching technique so as to position the carbon nanotube device according to the arrangement of the catalyst grains. Therefore, the carbon nanotube device can be formed on a large-area chip can be achieved so as to further fabricate arrays of carbon nanotube memories and transistors.