| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new photo-sensitive acid generator adaptable for far ultraviolet rays represented by especially ArF eximer laser and F<SB>2</SB>eximer laser, having a high transparency to radiation, also sufficient sensitivity, heat resistance, preservation stability, etc., and a positive type photoresist composition containing the radiation-sensitive acid generator. <P>SOLUTION: This radiation sensitive acid generator consists of a compound expressed by general formula (1) (wherein, R<SP>1</SP>is an alkyl, an alkylthio, a phenylthio, thiol, nitrile or a halogen atom; R<SP>2</SP>is an alkyl; (n) is 0 or 1; (x) is an integer of 0-7; (y) is an integer of 0-4; and X<SP>-</SP>is a monovalent non-nucleophilic anion). The positive type photoresist compound contains (A) the radiation sensitive acid generator and an acid dissociative group-containing resin, or (B) the radiation sensitive acid generator, an alkali soluble resin and an alkali solubility-controlling agent. <P>COPYRIGHT: (C)2004,JPO |
