发明名称 HETERO-JUNCTION BIPOLAR TRANSISTORS AND EPITAXIAL WAFER THEREFOR
摘要 PROBLEM TO BE SOLVED: To provide an epitaxial wafer for an HBT (Hetero junction Bipolar Transistor) having an emitter-base interface of low density at the level of a recombination center. SOLUTION: In the epitaxial wafer for the HBT provided with a GaAs base layer 6 and an emitter layer 5 consisting of InGa or AlGaAs, a super lattice spacer layer 11 consisting of AlGaAs/GaAs is inserted between the base layer 6 and the emitter layer 5 to improve a current amplification factorβ. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004063640(A) 申请公布日期 2004.02.26
申请号 JP20020217990 申请日期 2002.07.26
申请人 HITACHI CABLE LTD 发明人 SASAKI YUKIO;FUJIO SHINJIRO
分类号 H01L21/331;H01L21/20;H01L29/205;H01L29/737;(IPC1-7):H01L21/331 主分类号 H01L21/331
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