发明名称 |
HETERO-JUNCTION BIPOLAR TRANSISTORS AND EPITAXIAL WAFER THEREFOR |
摘要 |
PROBLEM TO BE SOLVED: To provide an epitaxial wafer for an HBT (Hetero junction Bipolar Transistor) having an emitter-base interface of low density at the level of a recombination center. SOLUTION: In the epitaxial wafer for the HBT provided with a GaAs base layer 6 and an emitter layer 5 consisting of InGa or AlGaAs, a super lattice spacer layer 11 consisting of AlGaAs/GaAs is inserted between the base layer 6 and the emitter layer 5 to improve a current amplification factorβ. COPYRIGHT: (C)2004,JPO
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申请公布号 |
JP2004063640(A) |
申请公布日期 |
2004.02.26 |
申请号 |
JP20020217990 |
申请日期 |
2002.07.26 |
申请人 |
HITACHI CABLE LTD |
发明人 |
SASAKI YUKIO;FUJIO SHINJIRO |
分类号 |
H01L21/331;H01L21/20;H01L29/205;H01L29/737;(IPC1-7):H01L21/331 |
主分类号 |
H01L21/331 |
代理机构 |
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地址 |
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