| 摘要 |
PROBLEM TO BE SOLVED: To provide, as a material for an insulating film for a semiconductor device or the like, a coating liquid for forming an insulating film which uses a siloxane polymer, with which an insulating film having a superior relative permittivity, especially an insulating film for semiconductor manufacturing equipment, can be formed. SOLUTION: The coating liquid for forming an insulating film for a semiconductor device contains an Si atom combined with at least one kind of organic group, and a siloxane polymer whose branching frequency A found by a spectrum observed by small-angle X-ray scattering is within a range of -2.0>A>-2.8 (A is a dimensionless value). COPYRIGHT: (C)2004,JPO
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