发明名称 Chuck, lithographic apparatus and device manufacturing method
摘要 <p>A lithographic projection apparatus 1 with an electrostatic chuck 10. The electrostatic chuck 10 comprises a dielectric element 12 which has a plurality of pins 16 formed on a first surfaces. The item to be clamped is clamped in position on the chuck 10 by applying a potential difference between an electrode 14 located on the surface of the dielectric member opposite to the clamping surface and an electrode 20 located on the clamping surface of the item 18 to be clamped. The pins are provided with at least an upper conducting layer, which serves to minimize the Johnsen-Rahbek effect, allowing the substrate to be released more quickly. &lt;IMAGE&gt;</p>
申请公布号 EP1391786(A1) 申请公布日期 2004.02.25
申请号 EP20030255161 申请日期 2003.08.20
申请人 ASML NETHERLANDS B.V. 发明人 HOEKS, MARTINUS HENDRICUS HENDRICUS;OTTENS, JOOST JEROEN
分类号 G03F7/20;H01L21/683;(IPC1-7):G03F7/20;H01L21/68;H01L21/00 主分类号 G03F7/20
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