发明名称 Semiconductor device and its manufacture
摘要 A semiconductor device having: a substrate having a first area and a second area surrounding the first area; an insulating film formed in the second area; electrodes formed above the surface of the substrate in the first area; dielectric films formed above the electrodes; and an opposing electrode formed above the dielectric films, wherein the shape of a side wall of the insulating film includes a shape reflecting the outer peripheral shape of a side wall of the electrode facing the side wall of the insulating film. The semiconductor device of high integration, low cost and high reliability can be realized.
申请公布号 US6693002(B2) 申请公布日期 2004.02.17
申请号 US20020241521 申请日期 2002.09.12
申请人 FUJITSU LIMITED KABUSHIKI KAISHA TOSHIBA;TOSHIBA KK 发明人 NAKAMURA SHUNJI;HATADA AKIYOSHI;FUKUZUMI YOSHIAKI
分类号 H01L21/8242;H01L21/02;H01L27/108;(IPC1-7):H01L21/823 主分类号 H01L21/8242
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