发明名称 PROCESS AND APPARATUS FOR FORMING DEPOSITION FILM
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a process and an apparatus for forming a deposition film with a high productivity which inhibit deterioration of characteristics of the deposition film caused by rise in temperature during film-deposition process and stably form a photovoltaic element showing an excellent mass-productivity and a high photoelectric conversion efficiency. <P>SOLUTION: In the process for depositing the film, a raw material gas is fed into a discharge space inside a reaction vessel, and electric discharge is induced to decompose the raw material gas by applying electric power. Here, two or more discharge means are located inside the reaction vessel. The process comprises a first step wherein the deposited film is formed by applying electric power to a first discharge means to induce electric discharge and a second step wherein the deposited film is formed by applying electric power to a second discharge means to induce electric discharge, wherein the first step is switched into the second step at a predetermined timing. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2004043910(A) 申请公布日期 2004.02.12
申请号 JP20020204344 申请日期 2002.07.12
申请人 CANON INC 发明人 YASUNO TOKUJI
分类号 C23C16/44;C23C16/46;C23C16/509;C23C16/54;H01L31/04;(IPC1-7):C23C16/54 主分类号 C23C16/44
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