| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate-processing equipment, wherein the tip part of a slit nozzle is cleaned at application of a resist, for stable discharging of the resist at the start of application. <P>SOLUTION: An absorbing member 71, which absorbs a resist well or a guide member comprising a plurality of narrow tubes, is arranged near a discharge opening 41d of a slit nozzle 41. A pre-dispensed resist 77 is selectively absorbed or guided by the absorbing member 71 or the guide member, under capillary action. Thus, the resist is suppressed from sticking to a tip part 41e of the slit nozzle 41. Since the resist concentration in the discharge opening 41d is even, the thickness of a film is stabilized, when the resist is applied. <P>COPYRIGHT: (C)2004,JPO |
