| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a system for correcting an aberration in an extreme ultraviolet lithography and to provide a reticle chuck or the like. <P>SOLUTION: An aberration correcting system includes a deformed reticle chuck for placing a reticle, a reticle height sensor for measuring a height of the reticle, a responsive substrate chuck for placing a responsive substrate, an optical system for irradiating the reticle with an extreme ultraviolet ray and projecting the extreme ultraviolet ray reflected on the reticle to the substrate and having a deformed mirror near an emitting pupil of the optical system, and a controller for controlling the deformed reticle chuck and the deformed mirror so as to correct the aberration of a reticle image formed by the optical system on the substrate based on the height of the reticle measured by the reticle height sensor. <P>COPYRIGHT: (C)2004,JPO</p> |
