| 摘要 |
PURPOSE: A substrate cleaning method and a substrate cleaning apparatus using the same are provided to be capable of effectively removing the particles attached on a substrate, preventing the reattachment of the particles, restraining the generation of water mark, and minimizing the consumption time of a drying process. CONSTITUTION: Predetermined process conditions are formed by vertically flowing the first DI(DeIonized) water(110) to a cleaning region and horizontally flowing the second DI water(120) to the cleaning region. A substrate loaded on a carrier(100) is transferred from a drying region to the cleaning region while carrying out a cleaning process at the substrate by using the first and second DI water. An isopropyl alcohol substitution region formed at the surface of the cleaning region by supplying isopropyl alcohol mixed DI water to the cleaning region. The isopropyl alcohol contained the mixed DI water, is substituted for the first and second DI water at the substrate. Then, the isopropyl alcohol of the substrate is dried.
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