发明名称 |
Detection and handling of semiconductor wafers and wafers-like objects |
摘要 |
An end-effector includes multiple vortex chucks for supporting a wafer. Vortex chucks are located along the periphery of the end-effector to help prevent a flexible wafer from curling. The end-effector has limiters to restrict the lateral movement of a supported wafer. In one example, the end-effector has a detector for detecting the presence of a wafer. The detector is mounted at a shallow angle to allow the end-effector to be positioned close to a wafer to be picked-up, thereby allowing detection of deformed wafers contained in a wafer cassette. The shallow angle of the detector also minimizes the thickness of the end-effector. Also disclosed is a wafer station with features similar to that of the end-effector.
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申请公布号 |
US2004012214(A1) |
申请公布日期 |
2004.01.22 |
申请号 |
US20030397906 |
申请日期 |
2003.03.25 |
申请人 |
CASAROTTI SEAN A.;BERGER ALEXANDER J.;KRETZ FRANK E. |
发明人 |
CASAROTTI SEAN A.;BERGER ALEXANDER J.;KRETZ FRANK E. |
分类号 |
H01L21/00;H01L21/683;(IPC1-7):B25J15/06 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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