| 摘要 |
A positive-working photosensitive composition containing (A) at least one member selected from a compound having a phenacylsulfonium salt structure and a compound having a sulfonium salt structure not having an aromatic ring, each of which compounds generates an acid upon irradiation with actinic rays or radiations and (B) a resin having specific repeating units, which is decomposed by the action of an acid to increase its solubility in an alkaline developing solution; a positive-working photosensitive composition containing (A) a compound to generate an aromatic sulfonic acid substituted with at least one fluorine atom and/or a group having at least one fluorine atom, upon irradiation with actinic rays or radiations and (B) a resin having a repeating unit having a maleic anhydride structure in the main chain thereof, which is decomposed by the action of an acid to increase its solubility in an alkaline developing solution; and a positive-working photosensitive composition containing (A) a sulfonium salt to generate an acid upon irradiation with actinic rays or radiations, (B) a specific resin to increase its solubility in an alkaline developing solution, and (C) a mixed solvent containing at least one member selected from a solvent group A: propylene glycol monoalkyl ether alkoxylates and at least one member selected from a solvent group B: propylene glycol monoalkyl ethers, alkyl lactates, and alkyl alkoxypropionates, or a mixed solvent containing at least one member selected from the solvent group A and at least one member selected from a solvent group C: gamma-butyrolactone, ethylene carbonate, and propylene carbonate.
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