Verfahren zur Wärmebehandlung von Halbleiterkörpern und Vorrichtung zur Durchführung dieses Verfahrens,申请号CH19660013550-传众专利搜索

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发明名称	Verfahren zur Wärmebehandlung von Halbleiterkörpern und Vorrichtung zur Durchführung dieses Verfahrens
摘要
申请公布号	CH469508(A)	申请公布日期	1969.03.15
申请号	CH19660013550	申请日期	1966.09.20
申请人	SIEMENS-SCHUCKERTWERKE AKTIENGESELLSCHAFT	发明人	DR. EMEIS,REIMER,DIPL.-PHYS.
分类号	C30B31/10;(IPC1-7):B01J17/34	主分类号	C30B31/10
代理机构		代理人
主权项
地址

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