发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT USING THE SAME, METHOD FOR MANUFACTURING RESIST PATTERN, AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having excellent resolution, adhesion properties and imaging properties, a photosensitive element, a method for manufacturing resist patterns, and a method for manufacturing a printed wiring board. <P>SOLUTION: The method for manufacturing resist patterns comprises coating the surface of a support with a photosensitive resin composition containing a carboxyl group-containing binder polymer containing 0.1 to 30wt% styrene or styrene derivatives as a copolymerization component, a photopolymerizable unsaturated compound (B), a photopolymerization initiator (C), and a general formula (1)(D), then drying the coating, laminating the same to form a photosensitive resin, laminating such photosensitive element on a substrate for circuit formation, irradiating the element with active rays in the shape of an image, and removing unexposed sections by development. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004004528(A) 申请公布日期 2004.01.08
申请号 JP20030011497 申请日期 2003.01.20
申请人 HITACHI CHEM CO LTD 发明人 OHASHI TAKESHI;ICHIKAWA TATSUYA
分类号 G03F7/004;C08F2/44;C08F257/02;C08F299/00;G03F7/027;H05K3/06;H05K3/18 主分类号 G03F7/004
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