APPARATUS FOR CLEANING ROBOT ARM OF WAFER TRANSPORTATION EQUIPMENT

摘要

PURPOSE: An apparatus for cleaning a robot arm of wafer transportation equipment is provided to prevent accumulation of particles or fume at the vacuum nozzle of the robot arm during normal stand-by state. CONSTITUTION: In a wafer transportation equipment for use in chemical mechanical polishing process, a solenoid valve(70) opens or closes an air supply path to the first air valve(72) and the second air valve(74) by an electric control operation. The first air valve(72) maintains or releases the vacuum state of the vacuum nozzle(78) by the air supply control of the solenoid valve(70). The second air valve(74) supplies or blocks the vacuum nozzle(78) with N2 gas by the air supply control of the solenoid valve(70). The vacuum nozzle(78) of the robot arm(76) holds the wafer when the first air valve(72) is opened, and the vacuum nozzle(78) is cleaned by the N2 gas when the second air valve(74) is opened.