发明名称 Semiconductor device, and method of manufacturing the same
摘要 There is described a semiconductor device having a storage node capacitor structure suitable for rendering memory cells compact, and storage nodes are prevented from tilting. The device includes a storage node which has a vertical surface extending in the direction perpendicular to the surface of a semiconductor substrate, and a dielectric film for tilt prevention purposes which is brought into close contact with the side surface of the vertical surface and which prevents the vertical surface from tilting.
申请公布号 US6673671(B1) 申请公布日期 2004.01.06
申请号 US20000722479 申请日期 2000.11.28
申请人 RENESAS TECH CORP 发明人 NISHIMURA HIROAKI;MAMETANI TOMOHARU;NAGAI YUKIHIRO;KINUGASA AKINORI;KISHIDA TAKESHI
分类号 H01L21/8242;H01L27/108;(IPC1-7):H01L21/824 主分类号 H01L21/8242
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