发明名称 SEMICONDUCTOR DEVICE HAVING CYLINDRICAL TYPE CAPACITOR AND METHOD FOR MANUFACTURING THE SAME
摘要 PURPOSE: A semiconductor device having a cylindrical type capacitor and a method for manufacturing the same are provided to be capable of preventing the fall-down phenomenon of a storage node by increasing the contact surface between the storage node and an insulating layer at the inner portion of a BC(Buried Contact) hole. CONSTITUTION: A semiconductor device having a cylindrical type capacitor is provided with a semiconductor substrate(101), the first poly layer pattern(103) formed at the upper portion of the semiconductor substrate, an insulating layer(102), a BC hole(105) formed at the upper portion of the first poly layer pattern, the second poly layer(106), a sputter layer(107), and a storage node(113-1) formed at the upper portion of the resultant structure. At this time, the lower portion(112) of the storage node is formed at the inner portion of the BC hole.
申请公布号 KR20040000007(A) 申请公布日期 2004.01.03
申请号 KR20020034374 申请日期 2002.06.19
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 HAN, MYEONG HUI;KWON, JUN MO;LEE, YUN JAE;PARK, WON MO
分类号 H01L27/108;(IPC1-7):H01L27/108 主分类号 H01L27/108
代理机构 代理人
主权项
地址
您可能感兴趣的专利