发明名称 |
SEMICONDUCTOR DEVICE HAVING CYLINDRICAL TYPE CAPACITOR AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
PURPOSE: A semiconductor device having a cylindrical type capacitor and a method for manufacturing the same are provided to be capable of preventing the fall-down phenomenon of a storage node by increasing the contact surface between the storage node and an insulating layer at the inner portion of a BC(Buried Contact) hole. CONSTITUTION: A semiconductor device having a cylindrical type capacitor is provided with a semiconductor substrate(101), the first poly layer pattern(103) formed at the upper portion of the semiconductor substrate, an insulating layer(102), a BC hole(105) formed at the upper portion of the first poly layer pattern, the second poly layer(106), a sputter layer(107), and a storage node(113-1) formed at the upper portion of the resultant structure. At this time, the lower portion(112) of the storage node is formed at the inner portion of the BC hole.
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申请公布号 |
KR20040000007(A) |
申请公布日期 |
2004.01.03 |
申请号 |
KR20020034374 |
申请日期 |
2002.06.19 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
HAN, MYEONG HUI;KWON, JUN MO;LEE, YUN JAE;PARK, WON MO |
分类号 |
H01L27/108;(IPC1-7):H01L27/108 |
主分类号 |
H01L27/108 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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