发明名称 |
Schottky gate field effect transistor |
摘要 |
A Schottky gate FET including a gate electrode (15) having a gate extension (16), a drain electrode (17) and a drain contact layer (14b) overlying a semi-dielectric substrate (11), wherein the gate extension (16) overlies at least part of the drain electrode (17) and the drain contact layer (14b). The vertical overlapping between the gate extension (16) and the drain contact region (Dc) prevents the current reduction to make the circuit module mounting the Schottky gate FET non-usable. <IMAGE> |
申请公布号 |
EP1326283(A3) |
申请公布日期 |
2004.01.02 |
申请号 |
EP20030000226 |
申请日期 |
2003.01.07 |
申请人 |
NEC COMPOUND SEMICONDUCTOR DEVICES, LTD. |
发明人 |
MIYOSHI, YOSUKE |
分类号 |
H01L21/338;H01L29/423;H01L29/812 |
主分类号 |
H01L21/338 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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