发明名称 SILICON CARBIDE BIPOLAR JUNCTION TRANSISTOR WITH OVERGROWN BASE REGION
摘要 Silicon carbide bipolar junction transistors having an overgrown base layer (18) are provided. The bipolar junction transistors can be made with a very thin (e.g., 0.3 µm or less) base layer while still possessing adequate peripheral base resistance values. Self aligning manufacturing techniques for making the silicon carbide bipolar junction transistors are also provided. Using these techniques, the spacing between emitter and base contacts on the device can be reduced. The silicon carbide bipolar junction transistors can also be provided with edge termination structures such as guard rings to increase the blocking capabilities of the device.
申请公布号 WO03073468(A3) 申请公布日期 2003.12.31
申请号 WO2003US04873 申请日期 2003.02.21
申请人 SEMISOUTH LABORATORIES, INC. 发明人 SANKIN, IGOR;DUFRENE, JANNA, B.
分类号 H01L21/04;H01L29/06;H01L29/10;H01L29/24;H01L29/732 主分类号 H01L21/04
代理机构 代理人
主权项
地址
您可能感兴趣的专利