| 摘要 |
<p>The invention relates to a method of altering the properties of a thin film (1) which is disposed on the surface of a support (2), thereby forming a substrate (3) which is used in the field of micro- and nano-electronics and micro- and nano-technology. The inventive method consists in producing at least one thin film (1) on a nanostructured support having a large specific surface area (2) and treating said nanostructured support (2) in order to generate internal stresses therein. In this way, a deformation is produced in said support at least in the plane of the thin film in such a way as to ensure a corresponding deformation in the thin film, in order to alter the properties thereof.</p> |
