METHOD FOR DEPOSITING SILICON DIOXIDE THIN FILM ONTO DIAMOND-LIKE CARBON AND ITS STRUCTURE

摘要

PROBLEM TO BE SOLVED: To provide a method for depositing a silicon dioxide thin film onto diamond-like carbon by which the silicon dioxide thin film can be uniformly deposited onto the diamond-like carbon and also to provide its structure.

SOLUTION: In the method for depositing the silicon dioxide thin film onto the diamond-like carbon, a diamond-like carbon film 2 is deposited onto a substrate 1 by a CVD method and a silicon film 3 is deposited as a buffer layer onto the diamond-like carbon film 2 by a sputtering method and then the silicon dioxide thin film 4 is deposited onto the silicon film 3.

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