发明名称 Electron beam irradiation system and electron beam irradiation method
摘要 In a partial-vacuum-type, electron-beam irradiation system having a construction such that a static-pressure floating pad is connected to a vacuum chamber incorporating an electron-beam column, and an electron-beam passes through an electron-beam passage of the static-pressure floating pad to impinge on a body to be irradiated in the condition where the static-pressure floating pad is contactlessly attracted to the body to be irradiated, a vacuum-seal valve for opening and closing the electron-beam passage is provided inside the static-pressure floating pad, and when the static-pressure floating pad is separated away from the body to be irradiated, the vacuum-seal valve is actuated to close the electron-beam passage, whereby the atmospheric air is prevented from flowing into the vacuum chamber.
申请公布号 US6649859(B2) 申请公布日期 2003.11.18
申请号 US20020083382 申请日期 2002.02.27
申请人 SONY CORPORATION 发明人 MIURA YOSHIHISA;AKI YUICHI
分类号 G21K5/04;B23K15/10;G03F7/20;G11B7/26;H01J37/18;H01J37/20;H01J37/305;(IPC1-7):B23K15/00 主分类号 G21K5/04
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