发明名称 Method of manufacturing a semiconductor device having flexible wiring substrate
摘要 Peeling between a molding resin and a substrate is prevented to improve the quality of a semiconductor device. A film substrate capable of being deformed following shrinkage upon curing of a molding resin and having plural partitioned device areas is provided. Then, a block molding is performed so as to cover the plural device areas in a lump on a chip bearing surface side of the film substrate. Thereafter the film substrate is subjected to dicing wherein a cutting blade is advanced toward a block molding portion to divide the film substrate device area by device area in accordance with a down cutting method, whereby peeling of the substrate in the dicing work can be prevented.
申请公布号 US6649448(B2) 申请公布日期 2003.11.18
申请号 US20010961368 申请日期 2001.09.25
申请人 HITACHI, LTD.;HITACHI HOKKAI SEMICONDUCTOR, LTD. 发明人 TOMIHARA SEIICHI
分类号 H01L23/12;H01L21/301;H01L21/56;H01L21/58;H01L23/31;H01L23/498;H05K3/00;H05K3/24;H05K3/28;(IPC1-7):H01L21/48 主分类号 H01L23/12
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