发明名称 METHOD FOR MAKING THIN-FILM SEMICONDUCTORS BASED ON I-III-VILESS THANSBGREATER THAN2LESS THAN/SBGREATER THAN COMPOUNDS, FOR PHOTOVOLTAIC APPLICATIONS
摘要 <p>The invention concerns a method for making thin-film CIGS which consists in: electrochemically depositing on a substrate a layer of stoichiometry close to CuInSe<SUB>2</SUB>; then rapidly annealing said layer from a light source with pulses of sufficient power to recrystallize CIS. Advantageously, the electrodeposited elements are premixed. Thus, after the deposition step, a homogeneous matrix is obtained which can support sudden temperature increases during the rapid annealing.</p>
申请公布号 AU2003246852(A1) 申请公布日期 2003.11.17
申请号 AU20030246852 申请日期 2003.04.23
申请人 ELECTRICITE DE FRANCE SERVICE NATIONAL 发明人 MOEZ BEN-FARAH;DANIEL LINCOT;JEAN-FRANCOIS GUILLEMOLES;PIERRE, PHILIPPE GRAND;PIERRE COWACHE;JACQUES VEDEL;STEPHANE TAUNIER;OLIVIER KERREC;MICHEL MAHE;DENIS GUIMARD
分类号 C25D5/50;C25D7/00;H01L31/032;H01L31/04;H01L31/18;(IPC1-7):H01L31/032 主分类号 C25D5/50
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