发明名称 ABRASIVE AND METHOD OF GRINDING
摘要 <p><P>PROBLEM TO BE SOLVED: To improve grinding efficiency by using an integrated grinding with carrier particles and abrasive grains having a hydrophilic surface. <P>SOLUTION: The method uses, for example, the abrasive 105 which contains the carrier particles 103 and the abrasive grains 104 and a fatty acid such as oleic acid or the like which is not shown in the figure, in a liquor set≥5 cSt (23°C) of viscosity, in grinding a semiconductor substrate 102. The carrier particles 103 for example, comprise an organic polymer with 1-20μm of average particle size and the abrasive grains 104, for example comprise silicon carbide (SiC) of particle size close to 2μm. The liquor uses a base oil comprising a paraffinic mineral oil. <P>COPYRIGHT: (C)2004,JPO</p>
申请公布号 JP2003321672(A) 申请公布日期 2003.11.14
申请号 JP20020128126 申请日期 2002.04.30
申请人 TANI YASUHIRO;NIHON MICRO COATING CO LTD;KINSEKI LTD 发明人 TANI YASUHIRO;KAWADA KENJI;SHU BUNGUN;TONAMI TOKIO;TAKAHASHI ATSUYA
分类号 B24B57/02;B24B37/00;C09K3/14;H01L21/304;(IPC1-7):C09K3/14 主分类号 B24B57/02
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