发明名称 |
A METHOD FOR MODIFYING A METALLIC SURFACE |
摘要 |
The invention relates to a method for modifying a metallic surface, which method comprises chemical vapour deposition on a substrate in a chamber adapted for CVD and involves at least the step o f interrupting the chemical vapour deposition by cutting off the flow of reactant gas, and where the substrate and the metallic surface form a part of a completed member and that this member during or after the interruption is subjected to a polishing of the metallic surface after depositing at least a part of the depositing metallic compound.
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申请公布号 |
WO03093530(A1) |
申请公布日期 |
2003.11.13 |
申请号 |
WO2002DK00280 |
申请日期 |
2002.05.01 |
申请人 |
DANFOSS A/S;ERIKSEN, SOEREN |
发明人 |
ERIKSEN, SOEREN |
分类号 |
C23C16/02;C23C16/06;C23C16/44;C23C16/448;C23C16/455;(IPC1-7):C23C16/00;C23C16/14 |
主分类号 |
C23C16/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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