发明名称 Fluoride cleaning masking system
摘要 The present invention relates to a maskant system for use with a fluoride cleaning system. The maskant system comprises a parting compound applied to a surface which requires protection and a chromium rich maskant for substantially preventing intergranular attack and which reduces a depletion zone. The parting compound contains colloidal silica, de-ionized water, fused alumina grains, and alumina powder. The maskant is comprised of chromium powder mixed with a binder, a wetting agent, a thickening agent, and water. The maskant system may be used to clean components formed from nickel-based or cobalt-based alloys using a fluoride cleaning system and has particular utility when components formed from single crystal nickel based alloys are cleaned using a fluoride cleaning system.
申请公布号 US6645926(B2) 申请公布日期 2003.11.11
申请号 US20010996533 申请日期 2001.11.28
申请人 UNITED TECHNOLOGIES CORPORATION 发明人 ABRILES BETH KWIATKOWSKI;MANIS BRYAN W.;MADHAVA MURALI N.
分类号 C23F11/00;C23G5/00;(IPC1-7):C11D7/08 主分类号 C23F11/00
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