| 摘要 |
PURPOSE: A purge method of a liquid delivery apparatus is provided to be capable of purging the residual of liquid material after carrying out a thin film depositing process. CONSTITUTION: After completing a thin film depositing process using a liquid delivery apparatus, the second switching valve becomes an 'on' state. Then, the third and fourth switching valve sequentially become the 'on' state for purging the residual of liquid material by supplying carrier gas from a carrier gas supply part(300) to a vaporizer(400). At this time, the liquid delivery apparatus is provided with a canister(100), a liquid mass flow controller(200), the carrier gas supply part(300), the vaporizer(400), and a trap part(500). Preferably, the canister, the liquid mass flow controller, and the vaporizer are sequentially connected by pipes, wherein the pipes have the first switching valves.
|
