| 摘要 |
PROBLEM TO BE SOLVED: To offer an aligner and an exposure method which can continuously change or adjust the image focus location and image surface of a projection optical system with high accuracy to perform accurate exposure processing. SOLUTION: This scanning aligner EX synchronously moves a mask M lit by exposure light and a photosensitive substrate P, while projecting and exposing the pattern image of the mask M on the photosensitive substrate P via projection optical systems PL1 through PL5. The equipment is provided with an image surface adjustment unit 10 which adjusts the position of the pattern image surface in the Z-axis direction along the light path of exposure light, and at the same time, adjusts the inclination of the pattern image surface. COPYRIGHT: (C)2004,JPO |
