发明名称 ELECTRON BEAM IRRADIATION PROCESSING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an electron beam irradiation processing device allowing accurate measurement of the quantity of electron beam emitted from an electron beam tube by reducing generation of the abnormal plasma inside a chamber due to introduction of a power supply line, which is used for supplying electric power to a power driving part such as a heater, into the chamber. SOLUTION: This electron beam irradiation processing device, in which electric power is supplied from an alternating current power source 111 to the power driving part 119 inside the chamber 10, a workpiece 13 is irradiated with electron beams emitted from the electron beam tube 1 toward the inside of the chamber 10, and a part of the emitted electron beams is detected for controlling 7, 8, 9, 2, 3, and 101 and electron beams emitted from the electron beam tube 1, is characterized in that the electric power is supplied to the power driving part 119 via a shield transformer 114 from the alternating current power source 111. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003302499(A) 申请公布日期 2003.10.24
申请号 JP20020105543 申请日期 2002.04.08
申请人 USHIO INC 发明人 KOIKE ICHIU;YAMAGUCHI MASANORI;HANEDA HIROSHIGE
分类号 G21K5/04;C23C14/30;(IPC1-7):G21K5/04 主分类号 G21K5/04
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