| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a solid-state imaging element of the structure, in which the sensitivity can be improved and which can be inexpensively and stably manufactured, and to provided a method for manufacturing the same. <P>SOLUTION: The solid-state imaging element comprises a waveguide, in which a hole 13 is formed at a position directly above a photodetecting sensor 2 of a transparent film 9 formed above the sensor 2 in each pixel and an organic polymer 10, having refractive index higher than that of the film 9 is embedded in the hole. A color filter is formed of the polymer in which a dye is added. The method for manufacturing the solid-state imaging element comprises, at least a step of forming the hole 13 in a part directly above the sensor 2 of the transparent film 9, the step of forming the organic polymer 10 by embedding the polymer in the hole 13, and the step of planarizing surface by etching back the polymer 10. <P>COPYRIGHT: (C)2004,JPO</p> |
