| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a heat cutoff component capable of preventing the thermal deformation of a table located in a vacuum chamber and an electron beam exposure apparatus having the heat cutoff component. <P>SOLUTION: A mirror 70 is positioned between a wafer table 40 disposed in the vacuum chamber and a printed board 50 attached to the wafer table 40 to reflect heat radiated from the printed board 50 in a direction opposite to the wafer table 40, thereby, the wafer table 40 is insulated from the printed board 50 thermally. <P>COPYRIGHT: (C)2004,JPO</p> |
