发明名称 SILICON BASED THIN FILM PHOTOELECTRIC CONVERTER
摘要 <P>PROBLEM TO BE SOLVED: To enhance conversion efficiency of a thin film photoelectric converter by absorbing light incident to the photoelectric converter effectively therein using a light scattering layer. <P>SOLUTION: The thin film photoelectric converter comprises a first electrode layer (transparent electrode) 2, at least one silicon based photoelectric conversion unit 10, and a second electrode layer (back electrode) deposited sequentially on a transparent substrate 1 wherein the second electrode layer comprises a light scattering layer 3 consisting of transparent conductive layers 3a and 3c and a transparent insulation layer 3b, and a light reflective metal layer 4. The light scattering layer 3 has a thickness in the range of 30-150 nm and the insulating thin film 3b is interposed with surface coverage of 30-70%. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2003298088(A) 申请公布日期 2003.10.17
申请号 JP20020100664 申请日期 2002.04.02
申请人 KANEGAFUCHI CHEM IND CO LTD 发明人 TAWADA HIROKO;FUKUDA SUSUMU;YAMAMOTO KENJI
分类号 H01L31/04 主分类号 H01L31/04
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