发明名称 PLASMA TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus which treats a large-area substrate or a rectangular substrate even when using reactive plasma. SOLUTION: The plasma treatment apparatus comprises a rectangular waveguide 1, a waveguide antenna 2 comprising slits formed in an H-face of the waveguide 1, an electromagnetic radiation window 4 formed of a dielectric substance, and a dielectric space 10 sandwiched between the waveguide antenna 2 and the electromagnetic radiation window 4. The plasma treatment apparatus produces plasma by electromagnetic waves radiated from the waveguide antenna 2 through the electromagnetic radiation window 4. The face of the waveguide 1 which faces the electromagnetic radiation window 4 is formed with an irregular section 11. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003282448(A) 申请公布日期 2003.10.03
申请号 JP20020077979 申请日期 2002.03.20
申请人 ADVANCED LCD TECHNOLOGIES DEVELOPMENT CENTER CO LTD 发明人 GOTO SHINJI;NAKADA YUKIHIKO
分类号 C23C16/511;C23C16/00;C23F1/00;C23F4/00;H01J37/32;H01L21/205;H01L21/30;H01L21/302;H01L21/3065;H05H1/00;H05H1/30;H05H1/46;(IPC1-7):H01L21/205 主分类号 C23C16/511
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