发明名称 |
PLASMA TREATMENT APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a plasma treatment apparatus which treats a large-area substrate or a rectangular substrate even when using reactive plasma. SOLUTION: The plasma treatment apparatus comprises a rectangular waveguide 1, a waveguide antenna 2 comprising slits formed in an H-face of the waveguide 1, an electromagnetic radiation window 4 formed of a dielectric substance, and a dielectric space 10 sandwiched between the waveguide antenna 2 and the electromagnetic radiation window 4. The plasma treatment apparatus produces plasma by electromagnetic waves radiated from the waveguide antenna 2 through the electromagnetic radiation window 4. The face of the waveguide 1 which faces the electromagnetic radiation window 4 is formed with an irregular section 11. COPYRIGHT: (C)2004,JPO
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申请公布号 |
JP2003282448(A) |
申请公布日期 |
2003.10.03 |
申请号 |
JP20020077979 |
申请日期 |
2002.03.20 |
申请人 |
ADVANCED LCD TECHNOLOGIES DEVELOPMENT CENTER CO LTD |
发明人 |
GOTO SHINJI;NAKADA YUKIHIKO |
分类号 |
C23C16/511;C23C16/00;C23F1/00;C23F4/00;H01J37/32;H01L21/205;H01L21/30;H01L21/302;H01L21/3065;H05H1/00;H05H1/30;H05H1/46;(IPC1-7):H01L21/205 |
主分类号 |
C23C16/511 |
代理机构 |
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代理人 |
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地址 |
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